Optical system and image pickup apparatus having the same

ABSTRACT

An optical system images an object with light with a wavelength of 8 μm or higher, and includes a diaphragm and an optical element having an aspherical surface and disposed at a position different from that of the diaphragm. In a section including an optical axis, a thickness of an optical element monotonously increases from an on-axis to an outermost off-axis or the optical element is the thinnest at a position other than an on-axis and an outermost off-axis. A predetermined condition is satisfied.

BACKGROUND OF THE INVENTION Field of the Invention

The present invention relates to an optical system compatible withinfrared light, for example, one suitable for an image pickup apparatussuch as a surveillance camera and an in-vehicle camera.

Description of the Related Art

There is known an optical system (“infrared optical system”) compatiblewith light in an infrared range (infrared light, infrared ray) (with awavelength of about 8 μm to 14 μm). Applying the infrared optical systemto the image pickup apparatus can visualize thermal information such asa temperature distribution of an object, which is unavailable in thevisible wavelength range (with a wavelength of about 0.4 μm to 0.7 μm).Materials (“infrared materials”) that transmit light in the infraredrange used for the infrared optical systems include, for example,germanium (Ge), gallium arsenide (GAAS), chalcogenide, zinc selenide(ZnSe), zinc sulfide (ZnS), silicon (Si) and resin (high densitypolyethylene, etc.) and the like. The infrared optical system isdemanded for high optical performance (resolution) in order to detectweak thermal information of a distant object. Japanese Patent Laid-OpenNo. (“JP”) 10-301024 discloses an infrared optical system having anaspherical surface for correcting various aberrations.

In order to process germanium or silicon into an aspherical shape,difficult processes such as grinding and polishing are required. Theoptical system disclosed in JP 10-301024 uses a flat lens made of thinflat silicon in order to reduce aspherical processing difficulty, but issilent about a shape of the flat lens so as to obtain the high opticalperformance. The infrared materials other than germanium and silicon canprovide an aspherical surface by molding, which is less difficult thangrinding or polishing. However, this moldable infrared material has alarge dispersion, and it is thus necessary to properly set the focallengths of the overall system and each lens in order to obtain the highoptical performance.

SUMMARY OF THE INVENTION

The present invention provides an optical system that is easy tomanufacture and has high optical performance in an infrared range, andan image pickup apparatus having the same.

An optical system according to one aspect of the present inventionimages an object with light with a wavelength of 8 μm or longer, andincludes an optical element having an aspherical surface and disposed ata position different from that of a diaphragm. In a section including anoptical axis, a thickness of an optical element monotonously increasesfrom an on-axis to an outermost off-axis or the optical element is thethinnest at a position other than an on-axis and an outermost off-axis(between an on-axis and an outermost off-axis not inclusive). Thefollowing conditional expression is satisfied:

0.0<|f/Pf1|<0.3

where f is a focal length of the optical system, and Pf1 is a focallength of the optical element. Alternatively, the following conditionalexpressions are satisfied:

20≤(N10−1)/(N8−N12)≤800

0.0<|f/Pf2|<0.3

where N8 is a refractive index of a material of an optical element at awavelength of 8 μm, N10 is a refractive index of the material at awavelength of 10 μm, N12 is a refractive index of the material at awavelength of 12 μm, f is a focal length of the optical system, and Pf2is a focal length of the optical element.

An image pickup apparatus that includes the above optical system alsoconstitutes another aspect of the present invention.

Further features of the present invention will become apparent from thefollowing description of exemplary embodiments with reference to theattached drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a sectional view of an optical system according to Example 1.

FIG. 2 is an MTF diagram of the optical system according to Example 1.

FIG. 3 is a sectional view of an optical system according to Example 2.

FIG. 4 is an MTF diagram of the optical system according to Example 2.

FIG. 5 is a sectional view of an optical system according to Example 3.

FIG. 6 is an MTF diagram of the optical system according to Example 3.

FIG. 7 is a sectional view of an optical system according to Example 4.

FIG. 8 is an MTF diagram of the optical system according to Example 4.

FIG. 9 is a sectional view of an optical system according to Example 5.

FIG. 10 is an MTF diagram of the optical system according to Example 5.

FIG. 11 is a sectional view of an optical system according to Example 6.

FIG. 12 is an MTF diagram of the optical system according to Example 6.

FIG. 13 is a sectional view of an optical system according to Example 7.

FIG. 14 is an MTF diagram of the optical system according to Example 7.

FIG. 15 is a sectional view of an optical system according to Example 8.

FIG. 16 is an MTF diagram of the optical system according to Example 8.

FIG. 17 is a sectional view of an optical system according to Example 9.

FIG. 18 is an MTF diagram of the optical system according to Example 9.

FIG. 19 is a sectional view of an optical system according to Example10.

FIG. 20 is an MTF diagram of the optical system according to Example 10.

FIG. 21 is a sectional view of an optical system according to Example11.

FIG. 22 is an MTF diagram of the optical system according to Example 11.

FIG. 23 is a sectional view of an optical system according to Example12.

FIG. 24 is an MTF diagram of the optical system according to Example 12.

FIG. 25 is a schematic view of principal part of a camcorder as anillustrative image pickup apparatus according to Example 13.

DESCRIPTION OF THE EMBODIMENTS

Referring now to the accompanying drawings, a detailed description willbe given of embodiments according to the present invention.Corresponding elements in respective figures will be designated by thesame reference numerals, and a duplicate description thereof will beomitted.

A silicon material or a germanium material in the description of eachexample means a material containing silicon or germanium as a maincomponent, and is not limited to a material exclusively consisting ofsilicon (Si) or germanium (Ge) but may contain a small amount ofimpurities.

Example 1

FIG. 1 is a sectional view of an optical system 100 according to thisexample. The optical system 100 is an infrared optical system having afocal length of 18 mm and an F-number of 0.8. The infrared opticalsystem, as used herein, is an optical system that images an object withlight having a wavelength of 8 μm or longer. The optical system 100includes, in order from the object side to the image side, a first lensL11 having a positive refractive power and made of a silicon material, athin aspherical plate (optical element) P11 made of a silicon materialand having an aspherical portion with a thickness that graduallyincreases from the center to the periphery (or with a thickness thatmonotonously increases from the on-axis to the outermost off-axis in thesection including the optical axis), a diaphragm (aperture stop) S1, asecond lens L12 having a positive refractive power and made of a siliconmaterial, a third lens L13 having a positive refractive power and madeof a silicon material, and a thin aspherical plate (optical element) P12made of a silicon material and having an aspherical portion with athickness that gradually increases from the center to the periphery. Thethin aspherical plates P11 and P12 are assumed to have a very thinthickness of several hundred μm. Therefore, it can be manufactured byeasy processing such as processing used to manufacture a Schmidtcorrection plate. Light in the infrared range (with a wavelength 8 to 14μm) guided by the optical system 100 passes through a cover glass CG1and forms an image on an infrared sensor IM1. A window material may beprovided between the first lens L11 and the object, or the cover glassCG1 may include an infrared material other than the germanium material.Table 1 shows numerical data of the optical system 100. The unit ofradius of curvature and spacing (distance or interval) is mm.

TABLE 1 RADIUS OF GLASS CURVATURE SPACING MATERIAL OBJECT PLANE —INFINITY L11 SPHERICAL SURFACE 16.30 1.50 SILICON SPHERICAL SURFACE17.91 5.76 P1 FLAT SURFACE FLAT SURFACE 0.20 SILICON ASPHERICAL SURFACE11 1.00E+16 4.16 S2  FLAT SURFACE — 4.10 L12 SPHERICAL SURFACE 10.191.60 SILICON SPHERICAL SURFACE 9.44 3.52 L13 SPHERICAL SURFACE 17.601.40 SILICON SPHERICAL SURFACE 27.55 1.82 P2  ASPHERICAL SURFACE 121.00E+16 0.20 SILICON FLAT SURFACE FLAT SURFACE 2.00 CG1 FLAT SURFACEFLAT SURFACE 1.00 GERMANIUM FLAT SURFACE FLAT SURFACE 3.60 IMAGE PLANE

Table 2 shows aspherical shape data.

TABLE 2 ASPHERICAL ASPHERICAL SURFACE 11 SURFACE 12 PARAXIAL RADIUS OF 1.00E+16  1.00E+16 CURVATURE R CONICAL COEFFIENT k 0.00 0.00  4TH-ORDERCOEFFICIENT A  1.15E−05 −3.67E−05  6TH-ORDER COEFFICIENT B −7.80E−08 1.24E−07  8TH-ORDER COEFFICIENT C  1.20E−09  7.32E−09 10TH-ORDERCOEFFICIENT D −1.07E−11 −6.89E−10 12TH-ORDER COEFFICIENT E  4.02E−14 1.36E−11 14TH-ORDER COEFFICIENT F −3.76E−17 −8.20E−14

The aspherical shape is expressed as follows:

$\begin{matrix}{Z = {\frac{( {1/R} )h^{2}}{1 + \sqrt{1 - {( {1 + k} )( {1/R} )^{2}h^{2}}}} + {Ah^{4}} + {Bh^{6}} + {Ch^{8}} + {Dh^{10}} + {Eh^{12}} + {Fh^{14}}}} & (1)\end{matrix}$

where Z is a displacement amount from a surface apex in an optical axisdirection, h is a height from an optical axis in a direction orthogonalto the optical axis, R is a paraxial radius of curvature, k is a conicalcoefficient, and A to F are fourth to fourteenth order asphericalcoefficients.

FIG. 2 is an MTF diagram of the optical system 100. A pixel pitch of ageneral infrared sensor is several tens of μm. This example uses theinfrared sensor IM1 having a pixel pitch of 17 μm by an implementation.In this case, the Nyquist frequency is about 30 lp/mm. In order toresolve the object at this Nyquist frequency, the MTF value of about 30%is empirically sufficient. The MTF value at the Nyquist frequency inthis example represented by reference numeral 11 in FIG. 2 is 28%. Sincethe MTF value is about 30% at the Nyquist frequency of the infraredsensor IM1, the optical system 100 exhibits excellent opticalperformance.

The silicon material has a high refractive index and a low dispersion inthe infrared range, and can provide high optical performance with anaspherical surface as part of the lens made of the silicon material. Inorder to process an optical element having an aspherical surface of asilicon material, a highly difficult process such as grinding orpolishing is required. Accordingly, a thin aspherical plate is useful inwhich it is easy to process an aspherical portion without any highlydifficult processes such as grinding or polishing. The thin asphericalplate can be manufactured by a photolithography process and a processfor the Schmidt correction plate, which is manufactured by adsorbing anaspherical prototype on a thin lens substrate, by transferring the shapeof the aspherical prototype, and by polishing it.

Table 3 shows a refractive index N10 and an Abbe number ν10 of amaterial that transmits infrared light. The refractive index N10 is arefractive index at a wavelength of 10 μm. The Abbe number ν10 isexpressed by the following expression (2) where N8 is a refractive indexof the material at a wavelength of 8 μm and N12 is a refractive index ofthe material at a wavelength of 12 μm. In general, the larger the Abbenumber is, the smaller the refractive index change (dispersion) becomesdue to the wavelength. Since numerical values are slightly differentdepending on each glass material manufacturer, Table 3 shows approximatenumerical values. In particular, the refractive index and Abbe number ofchalcogenides vary greatly depending on the type of compound using theoxygen group element of Group 16 in the periodic table. Depending on thetype of compound, the refractive index N10 varies from 2.0 to 4.0 andthe Abbe number ν10 varies from 100 to 800.

TABLE 3 GERMA- CALCO- ZINC ZINC NIUM SILICON RESIN GENIDE SULFIDESELENIDE REFRACTIVE 4.0 3.4 1.5 2.5 2.2 2.4 INDEX N10 DISPERSION 8611860 45 109 23 57 VALUE ν 10

$\begin{matrix}{{v10} = \frac{{N10} - 1}{{N8} - {N12}}} & (2)\end{matrix}$

Germanium and silicon each have a higher refractive index and a smallerdispersion than other materials. A general N-unit optical system has aconfiguration that satisfies the following expression (3) in order tocorrect the chromatic aberration. In the expression (3), f1, f2, f3, . .. , and fn are focal lengths of a first lens, a second lens, a thirdlens, . . . , and an n-th lens, respectively, and ν1, ν2, ν3, . . . ,and νn are Abbe numbers of the first lens, the second lens, the thirdlens, . . . , and the n-th lens, respectively.

$\begin{matrix}{{\frac{1}{f1v1} + \frac{1}{f2v2} + \frac{1}{f3v3} + \ldots + \frac{1}{fnvn}} = 0} & (3)\end{matrix}$

A lens usually has a positive Abbe number, and thus at least one lensmay have a negative focal length in order to reduce the chromaticaberration. Therefore, the optical system for correcting the chromaticaberration has a combination of a positive lens and a negative lens.Since the silicon lens has a very small dispersion, the chromaticaberration is small even with the silicon lens having a positiverefractive power alone, but there may be an element that plays a role ofa negative lens. In this example, the thin aspherical plate has anaspherical portion with a thickness that gradually increases from thecenter to the periphery, so that the chromatic aberration can becorrected with high accuracy. An optical system having a short focallength needs to converge light beams with a plurality of angles of view,so that the first lens may be a negative lens.

In order to correct the curvature of field, the optical system needs tosatisfy the following expression (4) so as to reduce the Petzval sum.Since the Petzval sum correlates with the curvature of field, thecurvature of field can be reduced by reducing the Petzval sum. In theexpression (4), f1, f2, f3, . . . , and fn are focal lengths of thefirst lens, the second lens, the third lens, . . . , and the n-th lens,respectively, and N1, N2, N3, . . . , and Nn are refractive indexes ofthe first lens, the second lens, the third lens, . . . , and the n-thlens, respectively.

$\begin{matrix}{{\frac{1}{f1N1} + \frac{1}{f2N2} + \frac{1}{f3N3} + \ldots + \frac{1}{fnNn}} = 0} & (4)\end{matrix}$

A lens usually has a positive refractive index, and thus at least onelens may have a negative focal length in order to reduce the Petzvalsum. Therefore, the optical system for correcting a curvature of fieldhas a combination of a positive lens and a negative lens. Since asilicon lens has a very large refractive index, the Petzval sum can bereduced only by the silicon lens having a positive refractive power, butthere may be an element that plays a role of a negative lens. In thisexample, the Petzval sum can be corrected with high accuracy by the thinaspherical plate having an aspherical portion with a thickness thatgradually increases from the center to the periphery. An optical systemhaving a short focal length needs to converge light beams with aplurality of angles of view, so that the first lens may be a negativelens.

For high optical performance, it is important to correct a sphericalaberration with high accuracy that is proportional to the pupil diameterof the lens. It is useful to share the spherical aberration with eachlens and to correct it. In each example, the spherical lens having themain refractive power may be a positive lens. Thereby, the light beamscan be gently converged, and the spherical aberration can be suppressed.An optical system having a short focal length needs to converge lightbeams with a plurality of angles of view, so that the first lens may bea negative lens.

A bright F-number lens such as an infrared lens needs to correct ahigh-order curvature of field with high accuracy in order to obtainexcellent imaging performance. Accordingly, the present invention placesthe thin aspherical plate P11 at a position different from that of thediaphragm S1, and causes the aspherical portion of the thin asphericalplate P11 to correct the higher-order curvature of field. Each exampleplaces the thin aspherical plate P12 having a small refractive power ata position close to the diaphragm S1 on the object side or the imageside of the diaphragm S1 and corrects a higher-order curvature of fieldand spherical aberration. That is, the conditions for Petzval sum andchromatic aberration correction are shared with spherical lenses havingmain refractive powers, and a thin aspherical plate having a smallrefractive power corrects a higher-order spherical aberration and ahigher-order curvature of field. It is particularly difficult to correctthe high-order curvature of field only with a spherical lens, and thus athin aspherical plate may be disposed at a position where the on-axisray and the off-axis ray are separated. Due to this configuration, theoptical system 100 can exhibit high optical performance.

Compared to other spherical lenses, the focal length of the thinaspherical plate gives only the action of the aspherical portion as aneffect, so it is unnecessary to have a high refractive power. Therefore,the optical systems according to Examples 1 to 8 satisfy the followingconditional expression (5):

0.0<|f/Pf1|<0.3  (5)

where f is a focal length of the optical system and Pf1 is a focallength of the thin aspherical plate.

The numerical range of the conditional expression (5) may be set to thatof the following conditional expression (5a):

0.00<|f/Pf1|<0.25  (5a)

As described above, the configuration according to this example canrealize an optical system that is easy to manufacture and has highoptical performance in the infrared range.

In the optical systems according to Examples 1 to 8, the thin asphericalplate may have a thin shape from the viewpoint of the transmittance ofthe silicon material. Hence, the following conditional expression (6)may be satisfied:

0.05≤T≤1.00  (6)

where T [mm] is a central thickness (thickness on the optical axis).

If the center thickness T is located out of the range of the conditionalexpression (6), the transmittance may be significantly reduced and theoptical performance may be deteriorated.

The numerical range of the conditional expression (6) may be set to thatof the following conditional expression (6a):

0.05≤T≤0.60  (6a)

The optical systems according to Examples 1 to 4 may satisfy at least ofthe following conditional expressions (7) to (9):

0.1<|f1/f|<6.0  (7)

0.1<f2/f<20.0  (8)

0.1<f3/f<5.0  (9)

where f1, f2, and f3 are focal lengths of the first to third lenses L11,L12, and L13, respectively.

The conditional expressions (7) to (9) are set to the optical systemsaccording to Examples 1 to 4 so as to satisfactorily correct variousaberrations such as the chromatic aberration, the spherical aberration,and the curvature of field and to exhibit high optical performance. Ifthe value is higher than the upper limit or lower than the lower limitin each of the conditional expressions (7) to (9), a correction balancebetween the curvature of field and the spherical aberration destroys,and the optical performance deteriorates.

The numerical ranges of the conditional expressions (7) to (9) may beset to those of the following conditional expressions (7a) to (9a):

0.1<|f1/f|<5.0  (7a)

0.5<f2/f<15.0  (8a)

0.1<f3/f<4.0  (9a)

Table 4 shows numerical values corresponding to the conditionalexpressions according to Examples 1 to 4.

TABLE 4 f f1 f2 f3 Pf1 Pf2 f1/f f2/f f3/f f/Pf1 f/Pf2 EX. 1 18 45.3104.7 16.3 0 0 2.52 5.82 1.05 — — EX. 2 14 57.5 147.6 13.2 0 0 4.1110.54 0.95 — — EX. 3 50 70.6 59.7 — 0 0 1.41 1.19 — — — EX. 4 6 −14.1611.3 15.08 51.7 49.6 −2.36 1.88 2.51 0.011605 0.012097

Example 2

FIG. 3 is a sectional view of an optical system 200 according to thisexample. The optical system 200 is an infrared optical system having afocal length of 14 mm and an F-number of 0.8. The optical system 200includes, in order from the object side to the image side, a first lensL21 having a positive refractive power and made of a silicon material, athin aspherical plate P21 made of a silicon material and having anaspherical portion with a thickness that gradually increases from thecenter to the periphery, a thin aspherical plate P22 made of a siliconmaterial and having an aspherical portion with a thickness thatgradually decreases from the center to the periphery, a diaphragm S2, asecond lens L22 having a positive refractive power and made of a siliconmaterial, a thin lens L23 having a positive refractive power and made ofa silicon material, and a thin aspherical plate P23 made of a siliconmaterial and having an aspherical portion with a thickness thatgradually increases from the center to the periphery. The thinaspherical plates P21, P22, and P23 are assumed to have a very thinthickness of several hundred μm. Therefore, each of them can bemanufactured by easy processing such as processing used to manufacturethe Schmidt correction plate. This example disposes a thin asphericalplate P22 in order to correct a high-order spherical aberration. Thelight in the infrared range guided by the optical system 200 passesthrough a cover glass CG2 and forms an image on an infrared sensor IM2.Table 5 shows numerical data of the optical system 200. The unit ofradius of curvature and spacing is mm.

TABLE 5 RADIUS OF GLASS CURVATURE SPACING MATERIAL OBJECT PLANE —INFINITY L21 SPHERICAL SURFACE 16.30 1.20 SILICON SPHERICAL SURFACE17.91 3.74 P21 FLAT SURFACE FLAT SURFACE 0.20 SILICON ASPHERICAL SURFACE21 1.00E+16 3.42 P22 FLAT SURFACE FLAT SURFACE 0.70 SILICON ASPHERICALSURFACE 22 1.00E+16 0.83 S2  FLAT SURFACE — 1.43 L22 SPHERICAL SURFACE10.19 1.60 SILICON SPHERICAL SURFACE 9.44 2.87 L23 SPHERICAL SURFACE17.60 1.40 SILICON SPHERICAL SURFACE 27.55 2.23 P23 ASPHERICAL SURFACE23 1.00E+16 0.20 SILICON FLAT SURFACE FLAT SURFACE 2.00 CG2 FLAT SURFACEFLAT SURFACE 1.00 GERMANIUM FLAT SURFACE FLAT SURFACE 3.00 IM2

Table 6 shows aspherical shape data. The aspherical shape is representedby the expression (1).

TABLE 6 ASPHERICAL ASPHERICAL ASPHERICAL SURFACE 21 SURFACE 22 SURFACE23 PARAXIAL RADIUS OF  1.00E+16  1.00+16  1.00E+18 CURVATURE R CONICALCOEFFIENT k 0.00 0.00 0  4TH-ORDER COEFFICIENT A  4.19E−05 −4.65E−05−0.00012  6TH-ORDER COEFFICIENT B  2.50E−08  1.72E−07 −1.04E−06 8TH-ORDER COEFFICIENT C −1.63E−10 −5.57E−09  1.02E−07 10TH-ORDERCOEFFICIENT D  6.34E−11  7.43E−10 −3.42E−09 12TH-ORDER COEFFICIENT E−9.48E−13 −6.76E−11  5.33E−11 14TH-ORDER COEFFICIENT F  6.30E−15 2.63E−14 −3.01E−13

FIG. 4 is an MTF diagram of the optical system 200. This example usesthe infrared sensor IM2 having a pixel pitch of 17 μm as animplementation. In this case, the Nyquist frequency is about 30 lp/mm.The MTF value at the Nyquist frequency in this example represented byreference numeral 21 in FIG. 4 is 43%. Since the MTF value is 30% orhigher at the Nyquist frequency of the infrared sensor IM2, the opticalsystem 200 exhibits excellent optical performance.

Example 3

FIG. 5 is a sectional view of an optical system 300 according to thisexample. The optical system 300 is an infrared optical system having afocal length of 50 mm and an F-number of 0.8. The optical system 300includes, in order from the object side to the image side, a first lensL31 made of a silicon material and having a positive refractive power, athin aspherical plate P31 made of a silicon material and having anaspherical portion with a thickness that gradually increases from thecenter to the periphery, a diaphragm S3, a second lens L32 having apositive refractive power and made of a silicon material, and a thinaspherical plate P32 made of a silicon material and having an asphericalportion with a thickness that gradually increases from the center to theperiphery. Therefore, it can be manufactured by easy processing such asa bending process used to manufacture the Schmidt correction plate. Thethin aspherical plates P31 and P32 are assumed to have a very thinthickness of several hundred μm. Light in the infrared range guided bythe optical system 300 passes through a cover glass CG3 and forms animage on an infrared sensor IM3. Table 7 shows numerical data of theoptical system 300. The unit of radius of curvature and spacing is mm.

TABLE 7 RADIUS OF GLASS CURVATURE SPACING MATERIAL OBJECT PLANE —INFINITY L31 SPHERICAL SURFACE 16.30 3.5 SILICON SPHERICAL SURFACE 17.919.0 P31 FLAT SURFACE FLAT SURFACE 0.3 SILICON ASPHERICAL SURFACE 311.00E+16 0.7 S3  FLAT SURFACE FLAT SURFACE 31.6 L32 SPHERICAL SURFACE52.95227 1.8 SILICON SPHERICAL SURFACE 82.412 14.0 P32 ASPHERICALSURFACE 32 1.00E+16 0.2 SILICON FLAT SURFACE FLAT SURFACE 3.7 CG3 FLATSURFACE FLAT SURFACE 1.0 GERMANIUM FLAT SURFACE FLAT SURFACE 3.0 IM3

Table 8 shows aspherical shape data. The aspherical shape is representedby the expression (1).

TABLE 8 ASPHERICAL ASPHERICAL SURFACE 31 SURFACE 32 PARAXIAL RADIUS OF 1.00E+18  1.00E+18 CURVATURE R CONICAL COEFFIENT k 0.00 0.00  4TH-ORDERCOEFFICIENT A  3.27E−07 −7.33E−06  6TH-ORDER COEFFICIENT B −1.17E−10 3.85E−08  8TH-ORDER COEFFICIENT C  4.20E−14  9.48E−11 10TH-ORDERCOEFFICIENT D −2.11E−17 −1.46E−11 12TH-ORDER COEFFICIENT E  6.93E−21 1.69E−13 14TH-ORDER COEFFICIENT F  0.00E+00 −5.85E−16

FIG. 6 is an MTF diagram of the optical system 300. This example usesthe infrared sensor IM3 having a pixel pitch of 17 μm as animplementation. In this case, the Nyquist frequency is about 30 lp/mm.The MTF value at the Nyquist frequency of this example represented byreference numeral 31 in FIG. 6 is 32%. Since the MTF value is 30% orhigher at the Nyquist frequency of the infrared sensor IM3, the opticalsystem 300 exhibits excellent optical performance.

Example 4

FIG. 7 is a sectional view of an optical system 400 according to thisexample. The optical system 400 is an infrared optical system having afocal length of 6 mm and an F-number of 0.9. The optical system 400includes, in order from the object side to the image side, a first lensL41 having a negative refractive power and made of a silicon material, athin aspherical plate P41 made of a silicon material and having anaspherical portion with a thickness that gradually increases from thecenter to the periphery, a second lens L42 having a positive refractivepower and made of a silicon material, a diaphragm S4, a third lens L43having a positive refractive power and made of a silicon material, and athin aspherical plate P42 made of a silicon material and having anaspherical portion with a thickness that gradually increases from thecenter to the periphery. Therefore, it can be manufactured by easyprocessing such as a bending process used to manufacture the Schmidtcorrection plate. The thin aspherical plates P41 and P42 are assumed tohave a very thin thickness of several hundred μm. Light in the infraredrange guided by the optical system 400 passes through a cover glass CG4and forms an image on an infrared sensor IM4. Table 9 shows numericaldata of the optical system 400. The unit of radius of curvature andspacing is mm.

TABLE 9 RADIUS OF GLASS CURVATURE SPACING MATERIAL OBJECT PLANE —INFINITY L41 SPHERICAL SURFACE 9.745272 1.0 SILICON SPHERICAL SURFACE7.033832 6.3 P41 ASPHERICAL SURFACE 41 1249.747 0.2 SILICON FLAT SURFACEFLAT SURFACE 5.4 L42 SPHERICAL SURFACE −155.564 1.5 SILICON SPHERICALSURFACE −2.34E+01 0.6 S4  FLAT SURFACE FLAT SURFACE 6.5 L43 SPHERICALSURFACE 51.53527 1.0 SILICON FLAT SURFACE −122.591 1.3 P42 ASPHERICALSURFACE 42 1200.627 0.2 SILICON FLAT SURFACE FLAT SURFACE 2.0 CG4 FLATSURFACE FLAT SURFACE 1.0 GERMANIUM FLAT SURFACE FLAT SURFACE 3.0 IM4

Table 10 shows aspherical shape data. The aspherical shape isrepresented by the expression (1).

TABLE 10 ASPHERICAL ASPHERICAL SURFACE 41 SURFACE 42 PARAXIAL RADIUS OF 1.25E+03  1.20E+03 CURVATURE R CONICAL COEFFIENT k 0.00 0.00  4TH-ORDERCOEFFICIENT A −7.89E−05 −7.80E−05  6TH-ORDER COEFFICIENT B −2.17E−07−1.43E−06  8TH-ORDER COEFFICIENT C −1.46E−08  1.44E−07 10TH-ORDERCOEFFICIENT D  5.68E−10 −6.54E−09 12TH-ORDER COEFFICIENT E −8.71E−12 1.36E−10 14TH-ORDER COEFFICIENT F  8.49E−14 −1.10E−12

FIG. 8 is an MTF diagram of the optical system 400. This example usesthe infrared sensor IM4 having a pixel pitch of 17 μm as animplementation. In this case, the Nyquist frequency is about 30 lp/mm.The MTF value at the Nyquist frequency in this example represented byreference numeral 41 in FIG. 8 is 36%. Since the MTF value is 30% orhigher at the Nyquist frequency of the infrared sensor IM4, the opticalsystem 400 exhibits excellent optical performance.

Example 5

FIG. 9 is a sectional view of an optical system 500 according to thisexample. The optical system 500 is an infrared optical system having afocal length of 4.5 mm and an F-number of 0.8. The optical system 500includes, in order from the object side to the image side, a first lensL51 having a negative refractive power and made of a silicon material, athin aspherical plate P51 made of a silicon material and having anaspherical portion that is the thinnest between the center and theoutermost periphery not inclusive (with a thickness that becomes thethinnest at a position other than an on-axis and an outermost off-axis(between the on-axis and the outermost off-axis not inclusive) in asection including the optical axis), a second lens L52 having a positiverefractive power and made of a silicon material, a diaphragm S5, and athird lens L53 having a positive refractive power and made of a siliconmaterial. The thin aspherical plates P51 and P52 are assumed to have avery thin thickness of several hundred μm. Therefore, it can bemanufactured by easy processing such as a bending process used tomanufacture the Schmidt correction plate. Light in the infrared rangeguided by the optical system 500 passes through a cover glass CG5 andforms an image on an infrared sensor IM5. Table 11 shows numerical dataof the optical system 500. The unit of radius of curvature and spacingis mm.

TABLE 11 RADIUS OF GLASS CURVATURE SPACING MATERIAL OBJECT PLANE —INFINITY L51 SPHERICAL SURFACE 8.53 0.45 SILICON SPHERICAL SURFACE 6.3110.48 P51 ASPHERICAL SURFACE 51 196.43 0.20 SILICON FLAT SURFACE FLATSURFACE 7.22 L52 SPHERICAL SURFACE −4.39E+01 1.50 SILICON SPHERICALSURFACE −22.31 0.10 S5  FLAT SURFACE FLAT SURFACE 4.04 L53 SPHERICALSURFACE 14.84 1.65 SILICON SPHERICAL SURFACE 24.16 2.26 SPHERICALSURFACE FLAT SURFACE 2.00 SILICON FLAT SURFACE FLAT SURFACE 1.00 CG5FLAT SURFACE FLAT SURFACE 2.00 GERMANIUM FLAT SURFACE FLAT SURFACE 2.10IM5

Table 12 shows aspherical shape data. The aspherical shape isrepresented by the expression (1).

TABLE 12 ASPHERICAL SURFACE 51 PARAXIAL RADIUS OF CURVATURE R  1.96E+02CONICAL COEFFIENT k 0.00  4TH-ORDER COEFFICIENT A −4.11E−05  6TH-ORDERCOEFFICIENT B  2.12E−07  8TH-ORDER COEFFICIENT C  0.00E+00 10TH-ORDERCOEFFICIENT D  0.00E+00 12TH-ORDER COEFFICIENT E  0.00E+00 14TH-ORDERCOEFFICIENT F  0.00E+00

FIG. 10 is an MTF diagram of the optical system 500. This example usesthe infrared sensor IM5 having a pixel pitch of 17 μm as animplementation. In this case, the Nyquist frequency is about 30 lp/mm.The MTF value at the Nyquist frequency in this example represented byreference numeral 51 in FIG. 10 is 48%. Since the MTF value is 30% orhigher at the Nyquist frequency of the infrared sensor IM5, the opticalsystem 500 exhibits excellent optical performance.

One method of correcting a curvature of field with high accuracy is amethod of placing a thin aspherical plate having an aspherical effect ata position where light rays at respective angles of view are separated.The position where the light rays at respective angles of view areseparated is different from the position of the diaphragm. Scattering ofrays at respective angles of view is corrected by the aspherical surfaceportion. Since the curvature of field correction up to the fourth-orderaspherical term is not enough, it is necessary to have an asphericalshape represented by a function having a sixth-order or higheraspherical term. It is necessary for the aberration correction that theshape has the thinnest thickness between the center and the outermostperiphery (not inclusive).

The thin aspherical plate may be disposed at a position different fromthe position where the diaphragm is disposed from the viewpoint ofcurvature of field correction. The following expression (10) may besatisfied when the thin aspherical plate is disposed on the object sideof the diaphragm:

PZ/LP<0.8  (10)

where LP is a distance from the first lens to the diaphragm, and PZ is adistance from the diaphragm to the thin aspherical plate.

When the thin aspherical plate is disposed on the image side of thediaphragm, the following conditional expression (11) may be satisfied:

PZ/LS<0.8  (11)

where LS is a distance from the diaphragm to the image plane, and PZ isa distance from the diaphragm to the thin aspherical plate.

The numerical ranges of the conditional expressions (10) and (11) may beset to those of the following conditional expressions (10a) and (11a).

0.1<PZ/LP<0.7  (10a)

0.1<PZ/LS<0.7  (11a)

The optical systems according to Examples 5 to 8 may satisfy at leastone of the following conditional expressions (12) to (14):

0.1<|f1/f|<5.0  (12)

0.1<f2/f<10.0  (13)

0.1<f3/f<10.0  (14)

The conditional expressions (12) to (14) are set to the optical systemsaccording to Examples 5 to 8 so as to satisfactorily correct variousaberrations such as the chromatic aberration, the spherical aberration,and the curvature of field and to exhibit high optical performance. Ifthe value is higher than the upper limit or lower than the lower limitin each of the conditional expressions (12) to (14), the correctionbalance between the curvature of field and the spherical aberrationdestroys, and the optical performance is deteriorated.

The numerical ranges of the conditional expressions (12) to (14) may beset to those of the following conditional expressions (12a) to (14a).

0.1<|f1/f|<3.5  (12a)

0.5<f2/f<7.0  (13a)

0.1<f3/f<4.0  (14a)

Tables 13 and 14 show numerical values corresponding to the conditionalexpressions according to Examples 5 to 8.

TABLE 13 f f1 f2 f3 Pf f1/f f2/f f3/f f/Pf EX. 5 4.5 −11.68 17.91 15.1481.34 −2.60 3.98 3.14 0.055 EX. 6 4.5 −10.34 16.23 13.47 72.62 −2.303.61 2.99 0.062 EX. 7 3 −5.795 18.257 9.4242 31.166 −1.93 6.09 3.140.096 EX. 8 6 −13.09 22.268 12.316 28.474 −2.18 3.71 2.05 0.211

TABLE 14 LP LS PZ PZ/LP PZ/LS T1 EX. 5 15.05 19.95 8.81 059 — 0.20 EX. 616.69 18.3 10.39 — 0.57 0.22 EX. 7 7.23 19.73 12.01 — 0.61 0.33 EX. 88.54 23.74 15.79 — 0.67 0.45

Example 6

FIG. 11 is a sectional view of an optical system 600 according to thisexample. The optical system 600 is an infrared optical system having afocal length of 4.5 mm and an F-number of 0.8. The optical system 600includes, in order from the object side to the image side, a first lensL61 made of a silicon material and having a negative refractive power, asecond lens L62 made of a silicon material and having a positiverefractive power, a diaphragm S6, a third lens L63 having a positiverefractive power and made of a silicon material, and a thin asphericalplate P61 made of a silicon material and having an aspherical portionthat is the thinnest between the center and the outermost periphery (notinclusive). Light in the infrared range guided by the optical system 600passes through a cover glass CG6 and forms an image on an infraredsensor IM6. Table 15 shows numerical data of the optical system 600. Theunit of radius of curvature and spacing is mm.

TABLE 15 RADIUS OF GLASS CURVATURE SPACING MATERIAL OBJECT — INFINITYPLANE L61 SPHERICAL SURFACE 9.46 0.45 SILICON SPHERICAL SURFACE 6.6314.65 L62 SPHERICAL SURFACE 49.33 1.50 SILICON SPHERICAL SURFACE −186.710.10 S6 FLAT SURFACE FLAT SURFACE 7.51 L63 SPHERICAL SURFACE 14.94 1.70SILICON SPHERICAL SURFACE 25.41 1.18 P61 ASPHERICAL SURFACE 61 175.360.22 SILICON SPHERICAL SURFACE FLAT SURFACE 2.00 CG6 FLAT SURFACE FLATSURFACE 1.00 GERMANIUM FLAT SURFACE FLAT SURFACE 4.68 IM6 — —

Table 16 shows aspherical shape data. The aspherical shape isrepresented by the expression (1).

TABLE 16 ASPHERICAL SURFACE 61 PARAXIAL RADIUS OF CURVATURE R 175.359CONICAL COEFFICIENT k 0.00 4TH-ORDER COEFFICIENT A −6.07E−05  6TH-ORDERCOEFFICIENT B 3.43E−07 8TH-ORDER COEFFICIENT C 0.00E+00 10TH-ORDERCOEFFICIENT D 0.00E+00 12TH-ORDER COEFFICIENT E 0.00E+00 14TH-ORDERCOEFFICIENT F 0.00E+00

FIG. 12 is an MTF diagram of an optical system 600. In this example, aninfrared sensor IM6 having a pixel pitch of 17 μm is used as an example.In this case, the Nyquist frequency is about 30 lp/mm. The MTF value atthe Nyquist frequency of this example represented by reference numeral61 in FIG. 12 is 50%. Since the MTF value is 30% or higher at theNyquist frequency of the infrared sensor IM6, the optical system 600exhibits excellent optical performance.

Example 7

FIG. 13 is a sectional view of an optical system 700 according to thisexample. The optical system 700 is an infrared optical system having afocal length of 3 mm and an F-number of 0.8. The optical system 700includes, in order from the object side to the image side, a first lensL71 having a negative refractive power and made of a silicon material, adiaphragm S7, a second lens L72 having a positive refractive power andmade of a silicon material, a third lens L73 having a positiverefractive power and made of a silicon material, and a thin asphericalplate P71 made of a silicon material and having an aspherical portionthat is the thinnest between the center and the outermost periphery (notinclusive). Light in the infrared range guided by the optical system 700passes through a cover glass CG7 and forms an image on an infraredsensor IM7. Table 17 shows numerical data of the optical system 700. Theunit of radius of curvature and spacing is mm.

TABLE 17 RADIUS OF GLASS CURVATURE SPACING MATERIAL OBJECT — INFINITYPLANE L71 SPHERICAL SURFACE 9.72 0.45 SILICON SPHERICAL SURFACE 7.4310.05 S7 SPHERICAL SURFACE FLAT SURFACE 0.10 L72 SPHERICAL SURFACE 19.871.00 SILICON FLAT SURFACE 28.08 8.70 L73 SPHERICAL SURFACE 15.16 2.00SILICON SPHERICAL SURFACE 29.26 2.62 F71 ASPHERICAL SURFACE 71 83.690.22 SILICON SPHERICAL SURFACE FLAT SURFACE 2.00 CG7 FLAT SURFACE FLATSURFACE 1.00 GERMANIUM FLAT SURFACE FLAT SURFACE 4.50 IM7 — —

Table 18 shows aspherical shape data. The aspherical shape isrepresented by the expression (1).

TABLE 18 ASPHERICAL SURFACE 71 PARAXIAL RADIUS OF CURVATURE R 75.259CONICAL COEFFICIENT k 0.00 4TH-ORDER COEFFICIENT A −1.35E−04  6TH-ORDERCOEFFICIENT B 6.62E−07 8TH-ORDER COEFFICIENT C 0.00E+00 10TH-ORDERCOEFFICIENT D 0.00E+00 12TH-ORDER COEFFICIENT E 0.00E+00 14TH-ORDERCOEFFICIENT F 0.00E+00

FIG. 14 is an MTF diagram of the optical system 700. This example usesthe infrared sensor IM7 having a pixel pitch of 17 μm as animplementation. In this case, the Nyquist frequency is about 30 lp/mm.The MTF value at the Nyquist frequency in this example represented byreference numeral 71 in FIG. 14 is 49%. Since the MTF value is 30% orhigher at the Nyquist frequency of the infrared sensor IM7, the opticalsystem 700 exhibits excellent optical performance.

Example 8

FIG. 15 is a sectional view of an optical system 800 according to thisexample. The optical system 800 is an infrared optical system having afocal length of 6 mm and an F-number of 0.8. The optical system 800includes, in order from the object side to the image side, a first lensL81 having a negative refractive power and made of a silicon material, adiaphragm S8, a second lens L82 having a positive refractive power andmade of a silicon material, a third lens L83 having a positiverefractive power and made of a silicon material, and a thin asphericalplate P81 made of a silicon material and having an aspherical portionthat is the thinnest between the center and the outermost periphery (notinclusive). Light in the infrared range guided by the optical system 800passes through a cover glass CG8 and forms an image on an infraredsensor IM8. Table 19 shows numerical data of the optical system 800. Theunit of radius of curvature and spacing is mm.

TABLE 19 RADIUS OF GLASS CURVATURE SPACING MATERIAL OBJECT — INFINITYPLANE L81 SPHERICAL SURFACE 10.79 0.45 SILICON SPHERICAL SURFACE 7.818.09 S8 SPHERICAL SURFACE FLAT SURFACE 0.10 L82 SPHERICAL SURFACE 24.501.00 SILICON FLAT SURFACE 43.71 9.98 L83 SPHERICAL SURFACE 16.13 2.00SILICON SPHERICAL SURFACE 32.18 2.71 P81 ASPHERICAL SURFACE 81 68.760.45 SILICON SPHERICAL SURFACE FLAT SURFACE 2.00 CG8 FLAT SURFACE FLATSURFACE 1.00 GERMANIUM FLAT SURFACE FLAT SURFACE 4.50 IM8 — —

Table 20 shows aspherical shape data. The aspherical shape isrepresented by the expression (1).

TABLE 20 ASPHERICAL SURFACE 81 PARAXIAL RADIUS OF CURVATURE R 68.759CONICAL COEFFICIENT k 0.00 4TH-ORDER COEFFICIENT A −1.02E−04  6TH-ORDERCOEFFICIENT B 3.50E−07 8TH-ORDER COEFFICIENT C 0.00E+00 10TH-ORDERCOEFFICIENT D 0.00E+00 12TH-ORDER COEFFICIENT E 0.00E+00 14TH-ORDERCOEFFICIENT F 0.00E+00

FIG. 16 is an MTF diagram of an optical system 800. This example usesthe infrared sensor IM8 having a pixel pitch of 17 μm as animplementation. In this case, the Nyquist frequency is about 30 lp/mm.The MTF value at the Nyquist frequency in this example represented byreference numeral 81 in FIG. 16 is 54%. Since the MTF value is 30% orhigher at the Nyquist frequency of the infrared sensor IM8, the opticalsystem 800 exhibits excellent optical performance.

Example 9

FIG. 17 is a sectional view of an optical system 900 according to thisexample. The optical system 900 is an infrared optical system having afocal length of 4.5 mm and an F-number of 0.8. The optical system 900includes, in order from the object side to the image side, a first lensL91 having a negative refractive power and made of a germanium material,a second lens L92 having a positive refractive power and made of asilicon material, a diaphragm S9, a third lens L93 having a positiverefractive power and made of a silicon material, and an optical element(aspherical lens) ASP91 having an aspherical surface and made of achalcogenide material. Chalcogenide contains a compound using an oxygengroup element of Group 16 in the periodic table, and the refractiveindex and Abbe number change depending on the type of the compound. Inthis example, IRG206 of NHG (Hubei New Huagung Information MaterialsCo., Ltd.) is used as chalcogenide, but the compound is not limited tothis example as long as it is a compound using an oxygen group elementof Group 16 in the periodic table. Light in the infrared range guided bythe optical system 800 passes through a cover glass CG9 and forms animage on an infrared sensor IM9. Table 21 shows numerical data of theoptical system 900. The unit of radius of curvature and spacing is mm.

TABLE 21 RADIUS OF GLASS CURVATURE SPACING MATERIAL OBJECT — INFINITYPLANE L91 11.4429 0.45 GERMANIUM 8.208534 28.08 L92 33.64908 1.50SILICON 103.3151 0.96 S9 FLAT SURFACE 10.01 L93 12.39436 1.70 SILICON17.8448 2.07 ASP91 358.0504 1.00 CALOGENIDE (ASPHERICAL SURFACE 91) FLATSURFACE 2.00 CG9 FLAT SURFACE 1.00 GERMANIUM FLAT SURFACE 4.56 IM9 —

Table 22 shows aspherical shape data. The aspherical shape isrepresented by the expression (1).

TABLE 22 ASPHERICAL SURFACE 91 PARAXIAL RADIUS OF CURVATURE R 358.050CONICAL COEFFICIENT k 0.00 4TH-ORDER COEFFICIENT A −1.05E−04  6TH-ORDERCOEFFICIENT B 2.95E−06 8TH-ORDER COEFFICIENT C −1.13E−07  10TH-ORDERCOEFFICIENT D 3.21E−09 12TH-ORDER COEFFICIENT E −4.79E−11  14TH-ORDERCOEFFICIENT F 2.81E−13

FIG. 18 is an MTF diagram of the optical system 900. This example usesthe infrared sensor IM9 having a pixel pitch of 17 μm as animplementation. In this case, the Nyquist frequency is about 30 lp/mm.The MTF value at the Nyquist frequency in this example represented byreference numeral 91 in FIG. 18 is 57%. Since the MTF value is 30% orhigher at the Nyquist frequency of the infrared sensor IM9, the opticalsystem 900 exhibits excellent optical performance.

Silicon materials and germanium materials each have a high refractiveindex and a low dispersion in the infrared range and can exhibit highoptical performance using an aspherical surface used for part of thelens made of silicon material or germanium material. However, in orderto process an optical element having an aspherical surface of a siliconmaterial or a germanium material, a highly difficult process such asgrinding or polishing is required.

On the other hand, chalcogenide, zinc selenium (ZnSe), zinc sulfide(ZnS), resin (high density polyethylene) and the like are materials thatcan be molded by heat or the like, but exhibits a large chromaticaberration amount due to a large dispersion. If a diffraction structureis provided on the lens surface in order to correct the chromaticaberration, unnecessary light may be incident on the infrared sensor dueto scattering in the diffraction structure, which may deteriorate theoptical performance.

A lens usually has a positive Abbe number, and thus at least one lensmay have a negative focal distance in order to reduce the chromaticaberration. Using materials with a large dispersion such aschalcogenide, zinc selenium, zinc sulfide, and resin (high densitypolyethylene) can suppress the chromatic aberration by increasing thefocal distance of the lens (or by reducing the refractive power).

One method of correcting the curvature of field with high accuracy is amethod of placing an optical element having an aspherical surface at aposition where light rays of respective angles of view are separated. Inan attempt to mainly correct the curvature of field, it is effective todispose an aspherical lens on the image side. When such a moldablematerial as chalcogenide, zinc selenide, zinc sulfide, and resin (highdensity polyethylene) is used for the aspherical lens, the chromaticaberration becomes a problem. In order to solve this problem, anaspherical lens having a long focal length is used in this example.

Thus, this example can improve optical performance by disposing theoptical element having an aspherical surface with a small refractivepower at a position different from that of the diaphragm. The opticalelement having an aspherical surface may satisfy the conditionalexpression of 20≤ν10≤2000. In order to improve the ease of manufacturing(molding and processing) an optical element having an asphericalsurface, the optical element may be made of a material having a largedispersion. More specifically, the optical element having an asphericalsurface may satisfy the conditional expression of 20≤ν10≤800.

Compared to aspherical lenses, aspherical lenses using materials withlarge dispersion need to suppress the chromatic aberration while givingonly the action of the aspherical part as an effect. Therefore, thefollowing expression (15) may be satisfied:

0.0<|f/Pf2|<0.3  (15)

where Pf2 is a focal length of the aspherical lens.

The numerical range of the conditional expression (15) may be set tothat of the following conditional expression (15a).

0.0<|f/Pf2|<0.1  (15a)

The numerical range of the conditional expression (15) may be set tothat of the following conditional expression (15b).

0.00<|f/Pf2|<0.07  (15b)

The aspherical lens using a material having a large dispersion may bedisposed on the image side of the diaphragm from the viewpoint of thecurvature of field correction. The following expression (16) may besatisfied:

0.3<PZ/LS<1.0  (16)

where PZ is a distance from the diaphragm to the aspherical lens.

The numerical range of the conditional expression (16) may be set tothat of the following conditional expression (16a).

0.4<PZ/LS<0.9  (16a)

The optical systems according to Examples 9 to 12 may satisfy at leastone of the following conditional expressions (17) to (19).

0.01<|f1/Pf2|<0.80  (17)

0.01<|f2/Pf2|<0.80  (18)

0.01<|f3/Pf2|<0.80  (19)

The conditional expressions (17) to (19) are set to the optical systemsaccording to Examples 9 to 12 so as to satisfactorily correct variousaberrations such as the chromatic aberration, the spherical aberration,and the curvature of field and to exhibit high optical performance. Ifthe value is higher than the upper limit or lower than the lower limitin each of the conditional expressions (17) to (19), the correctionbalance between the curvature of field and the spherical aberrationdestroys, and the optical performance is deteriorated.

The numerical ranges of the conditional expressions (17) to (19) may beset to those of the following conditional expressions (17a) to (19a).

0.01<|f1/Pf2|<0.50  (17a)

0.01<|f2/Pf2|<0.50  (18a)

0.01<|f3/Pf2|<0.50  (19a)

Tables 23 and 24 show numerical values corresponding to the conditionalexpressions according to Examples 9 to 12.

TABLE 23 f f1 f2 f3 Pf f1/f f2/f f3/f f/Pf EX. 9 4.5 −9.95 18.15 13.6090.16 −2.21 4.03 3.02 0.050 EX. 10 4.5 −10.24 17.92 13.54 130.83 −2.283.98 3.01 0.034 EX. 11 4.5 −9.834 17.78 13.538 140.82 −2.19 3.95 3.010.032 EX. 12 4.5 −10.66 17.884 13.547 203.53 −2.37 3.97 3.01 0.022

TABLE 24 LS PZ PZ/LS EX.9 22.34 13.78 0.62 EX.10 21.05 12.54 0.60 EX.1121.45 12.74 0.59 EX.12 20.4 12.24 0.60

Example 10

FIG. 19 is a sectional view of an optical system 1000 according to thisexample. The optical system 1000 is an infrared optical system having afocal length of 4.5 mm and an F-number of 0.8. The optical system 1000includes, in order from the object side to the image side, a first lensL101 having a negative refractive power and made of a silicon material,a second lens L102 having a positive refractive power and made of asilicon material, a diaphragm S10, a third lens L103 having a positiverefractive power and made of a silicon material, and an optical element(aspherical lens) ASP101 having an aspherical surface and made of a zincsulfide material. Light in the infrared range guided by the opticalsystem 1000 passes through a cover glass CG10 and forms an image on aninfrared sensor IM10. Table 25 shows numerical data of the opticalsystem 1000. The unit of radius of curvature and spacing is mm.

TABLE 25 RADIUS OF GLASS CURVATURE SPACING MATERIAL OBJECT — INFINITYPLANE L101 10.8801 0.45 SILICON 7.33552 16.85 L102 52.42293 1.50 SILICON−242.625 0.10 S10 FLAT SURFACE 9.32 L103 14.17181 1.70 SILICON 22.894531.53 ASP101 151.7479 1.00 ZINC (ASPHERICAL SULFIDE SURFACE 101) 1.73E+042.00 CG10 FLAT SURFACE 1.00 GERMANIUM FLAT SURFACE 4.56 IM10 —

Table 26 shows aspherical shape data. The aspherical shape isrepresented by the expression (1).

TABLE 26 ASPHERICAL SURFACE 101 PARAXIAL RADIUS OF CURVATURE R 151.748CONICAL COEFFICIENT k 0.00 4TH-ORDER COEFFICIENT A −1.34E−04  6TH-ORDERCOEFFICIENT B 4.16E−06 8TH-ORDER COEFFICIENT C 1.68E−07 10TH-ORDERCOEFFICIENT D 4.26E−09 12TH-ORDER COEFFICIENT E −5.50E−11  14TH-ORDERCOEFFICIENT F 2.81E−13

FIG. 20 is an MTF diagram of the optical system 1000. This example usesthe infrared sensor IM10 having a pixel pitch of 17 μm as animplementation. In this case, the Nyquist frequency is about 30 lp/mm.The MTF value at the Nyquist frequency in this example represented byreference numeral 101 in FIG. 20 is 52%. Since the MTF value is 30% orhigher at the Nyquist frequency of the infrared sensor IM10, the opticalsystem 1000 exhibits excellent optical performance.

Example 11

FIG. 21 is a sectional view of an optical system 1100 according to thisexample. The optical system 1100 is an infrared optical system having afocal length of 4.5 mm and an F-number of 0.8. The optical system 1100includes, in order from the object side to the image side, a first lensL111 having a negative refractive power and made of a silicon material,a second lens L112 having a positive refractive power and made of asilicon material, a diaphragm S11, a third lens L113 having a positiverefractive power and made of a silicon material, and an optical element(aspherical lens) lens ASP111 having an aspherical surface and made of azinc selenium material. Light in the infrared range guided by theoptical system 1100 passes through a cover glass CG11 and forms an imageon an infrared sensor IM11. Table 27 shows numerical data of the opticalsystem 1100. The unit of radius of curvature and spacing is mm.

TABLE 27 RADIUS OF GLASS CURVATURE SPACING MATERIAL OBJECT — INFINITYPLANE L111 11.24434 0.45 SILICON 7.41501 16.50 L112 42.69496 1.50SILICON 7444.902 0.10 S11 FLAT SURFACE 9.50 L113 14.16753 1.70 SILICON22.88135 1.54 ASP111 154.7086 1.00 ZINC (ASPHERICAL SELENIDE SURFACE111) 7.29E+02 2.00 CG11 FLAT SURFACE 1.00 GERMANIUM FLAT SURFACE 4.70IM11 —

Table 28 shows aspherical shape data. The aspherical shape isrepresented by the expression (1).

TABLE 28 ASPHERICAL SURFACE 111 PARAXIAL RADIUS OF CURVATURE R 154.709CONICAL COEFFICIENT k 0.00 4TH-ORDER COEFFICIENT A −1.23E−04 6TH-ORDERCOEFFICIENT B  3.58E−06 8TH-ORDER COEFFICIENT C  1.48E−07 10TH-ORDERCOEFFICIENT D  3.92E−09 12TH-ORDER COEFFICIENT E −5.29E−11 14TH-ORDERCOEFFICIENT F  2.81E−13

FIG. 22 is an MTF diagram of the optical system 1100. This example usesthe infrared sensor IM10 having a pixel pitch of 17 μm as animplementation. In this case, the Nyquist frequency is about 30 lp/mm.The MTF value at the Nyquist frequency in this example represented byreference numeral 111 in FIG. 22 is 57%. Since the MTF value is 30% orhigher at the Nyquist frequency of the infrared sensor IM10, the opticalsystem 1100 exhibits excellent optical performance.

Example 12

FIG. 23 is a sectional view of an optical system 1200 according to thisexample. The optical system 1200 is an infrared optical system having afocal length of 4.5 mm and an F-number of 0.8. The optical system 1200includes, in order from the object side to the image side, a first lensL121 having a negative refractive power and made of a silicon material,a second lens L122 having a positive refractive power and made of asilicon material, a diaphragm S12, a third lens L123 having a positiverefractive power and made of a silicon material, and an optical element(aspherical lens) ASP121 having an aspherical surface made of a resinmaterial. A resin material amount includes high-density polyethylene(HDPE), which is polyethylene having a density of 0.942 [kg/m³] orhigher. Light in the infrared range guided by the optical system 1200passes through a cover glass CG12 and forms an image on an infraredsensor IM12. Table 29 shows numerical data of the optical system 1200.The unit of radius of curvature and spacing is mm.

TABLE 29 RADIUS OF GLASS CURVATURE SPACING MATERIAL OBJECT — INFINITYPLANE L121 10.34174 0.45 SILICON 7.150503 17.55 L122 83.9322 1.50SILICON −87.8344 0.10 S12 FLAT SURFACE 8.88 L123 14.08102 1.70 SILICON22.61232 1.66 ASP121 120.1702 1.00 RESIN (ASPHERICAL SURFACE 121)−7.64E+02 2.00 CG12 FLAT SURFACE 1.00 GERMANIUM FLAT SURFACE 4.16 IM12 —

Table 30 shows aspherical shape data. The aspherical shape isrepresented by the expression (1).

TABLE 30 ASPHERICAL SURFACE 121 PARAXIAL RADIUS OF CURVATURE R 120.170CONICAL COEFFICIENT k 0.00 4TH-ORDER COEFFICIENT A −2.77E−04 6TH-ORDERCOEFFICIENT B  1.14E−05 8TH-ORDER COEFFICIENT C −4.22E−07 10TH-ORDERCOEFFICIENT D  8.76E−09 12TH-ORDER COEFFICIENT E −8.50E−11 14TH-ORDERCOEFFICIENT F  2.81E−13

FIG. 24 is an MTF diagram of the optical system 1200. This example usesthe infrared sensor IM7 having a pixel pitch of 17 μm as animplementation. In this case, the Nyquist frequency is about 30 lp/mm.The MTF value at the Nyquist frequency in this example represented byreference numeral 121 in FIG. 24 is 43%. Since the MTF value is 30% orhigher at the Nyquist frequency of the infrared sensor IM12, the opticalsystem 1200 exhibits excellent optical performance.

Example 13

In this example, an infrared camcorder (video camera) is an illustrativeimage pickup apparatus using the optical system according to eachexample. FIG. 25 is a schematic view of principal part of the camcorderaccording to this example. The camcorder has an imaging optical system11 including a camera body 13 and an optical system according to any oneof Examples 1 to 12. The camera body 13 includes an image sensor(infrared sensor) 12 such as a microbolometer that receives(photoelectrically converts) an object image formed by the imagingoptical system 11. The infrared sensor can use, for example, one formedby using vanadium oxide or amorphous silicon. An acquired image can beconfirmed on a display device 14. The display device 14 may beincorporated into the camera body 13 or may be separated from butcommunicable with the camera body 13 via wireless communications. Theoptical system according to each example is applicable to an imagepickup apparatus such as an in-vehicle camera or a surveillance camera.

Each example can provide an optical system having high opticalperformance in the infrared range and easy to manufacture, and an imagepickup apparatus having the same.

While the present invention has been described with reference toexemplary embodiments, it is to be understood that the invention is notlimited to the disclosed exemplary embodiments. The scope of thefollowing claims is to be accorded the broadest interpretation so as toencompass all such modifications and equivalent structures andfunctions.

This application claims the benefit of Japanese Patent Application No.2020-108208, filed on Jun. 23, 2020, which is hereby incorporated byreference herein in its entirety.

What is claimed is:
 1. An optical system configured to image an objectwith light with a wavelength of 8 μm or longer, the optical systemcomprising: a diaphragm; and an optical element having an asphericalsurface and disposed at a position different from that of the diaphragm,wherein in a section including an optical axis, a thickness of anoptical element monotonously increases from an on-axis to an outermostoff-axis, and wherein the following conditional expression is satisfied:0.0<|f/Pf1|<0.3 where f is a focal length of the optical system, and Pf1is a focal length of the optical element.
 2. The optical systemaccording to claim 1, further comprising a first lens closest to theobject, wherein the following conditional expression is satisfied:0.1<|f1/f|<6.0 where f1 is a focal length of the first lens.
 3. Theoptical system according to claim 1, further comprising a first lensclosest to the object, and a second lens adjacent to the first lens,wherein the following conditional expression is satisfied:0.1<|f2/f|<20.0 where f2 is a focal length of the second lens.
 4. Theoptical system according to claim 1, further comprising a first lensclosest to the object, a second lens adjacent to the first lens, and athird lens disposed on an image side of the second lens, wherein thefollowing conditional expression is satisfied:0.1<|f3/f|<5.0 where f3 is a focal length of the third lens.
 5. Anoptical system configured to image an object with light with awavelength of 8 μm or longer, the optical system comprising: adiaphragm; and an optical element having an aspherical surface anddisposed at a position different from that of the diaphragm, wherein ina section including an optical axis, the optical element is the thinnestat a position other than an on-axis and an outermost off-axis, andwherein the following conditional expression is satisfied:0.0<|f/Pf1|<0.3 where f is a focal length of the optical system, and Pf1is a focal length of the optical element.
 6. The optical systemaccording to claim 5, wherein the aspherical surface has a shaperepresented by a function of a sixth order or longer.
 7. The opticalsystem according to claim 5, further comprising a first lens closest tothe object, wherein the optical element is disposed on an object side ofthe diaphragm, and wherein the following conditional expression issatisfied:PZ/LP<0.8 where PZ is a distance from the diaphragm to the opticalelement, and LP is a distance from the diaphragm to the first lens. 8.The optical system according to claim 5, wherein the optical element isdisposed on an image side of the diaphragm, and wherein the followingconditional expression is satisfied:PZ/LS<0.8 where PZ is a distance from the diaphragm to the opticalelement, and LS is a distance from the diaphragm to an image plane. 9.The optical system according to claim 5, further comprising a first lensclosest to the object, wherein the following conditional expression issatisfied:0.1<|f1/f|<5.0 where f1 is a focal length of the first lens.
 10. Theoptical system according to claim 5, further comprising a first lensclosest to the object, and a second lens adjacent to the first lens,wherein the following conditional expression is satisfied:0.1<f2/f<10.0 where f2 is a focal length of the second lens.
 11. Theoptical system according to claim 5, further comprising a first lensclosest to the object, a second lens adjacent to the first lens, and athird lens disposed on an image side of the second lens, wherein thefollowing conditional expression is satisfied:0.1<f3/f<10.0 where f3 is a focal length of the third lens.
 12. Theoptical system according to claim 1, wherein the following conditionalexpression is satisfied:0.05≤T≤1.00 where T [mm] is a thickness of the optical element on anoptical axis.
 13. An optical system configured to image an object withlight with a wavelength of 8 μm or longer, the optical systemcomprising: a diaphragm; and an optical element having an asphericalsurface and disposed at a position different from that of the diaphragm,wherein the following conditional expressions are satisfied:20≤(N10−1)/(N8−−N12)≤8000.0<|f/Pf2|<0.3 where N8 is a refractive index of a material of anoptical element at a wavelength of 8 μm, N10 is a refractive index ofthe material at a wavelength of 10 μm, N12 is a refractive index of thematerial at a wavelength of 12 μm, f is a focal length of the opticalsystem, and Pf2 is a focal length of the optical element.
 14. Theoptical system according to claim 13, wherein the optical element isdisposed on an image side of the diaphragm, and wherein the followingconditional expression is satisfied:0.3<PZ/LS<1.0 where PZ is a distance from the diaphragm to the opticalelement, and LS is a distance from the diaphragm to an image plane. 15.The optical system according to claim 13, further comprising a firstlens closest to the object, wherein the following conditional expressionis satisfied:0.01<|f1/Pf2|<0.80 where f1 is a focal length of the first lens.
 16. Theoptical system according to claim 13, further comprising a first lensclosest to the object, and a second lens adjacent to the first lens,wherein the following conditional expression is satisfied:0.01<f2/Pf2<0.80 where f2 is a focal length of the second lens.
 17. Theoptical system according to claim 13, further comprising a first lensclosest to the object, a second lens adjacent to the first lens, and athird lens disposed on an image side of the second lens, wherein thefollowing conditional expression is satisfied:0.1<f3/Pf2<0.80 where f3 is a focal length of the third lens.
 18. Theoptical system according to claim 1, wherein the optical element is madeof a silicon material.
 19. The optical system according to claim 1,further comprising another optical element made of a silicon material ora germanium material.
 20. An image pickup apparatus comprising: theoptical system according to claim 1; and an image sensor configured toreceive light from the optical system.